Abstract
A novel technique, for obtaining the valence band state densities (VBSD's) of tetrahedrally coordinated amorphous semiconductors from normal incidence reflectance data, is applied to Si and Ge and GaP, GaAs and GaSb. The VBSD's of Si and Ge are similar to other published results, obtained by conventional techniques, and cannot be described by broadened crystalline VBSD's. On the other hand, the VBSD's of the 3–5's contain many of the crystalline features. The relation of these results to the structure of the amorphous phase is discussed.
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