Abstract
VUV spectroscopic ellipsometry down to 135nm is applied to the characterization of HfO2, Al2O3 and HfAlOx thin layers prepared by atomic layer chemical vapor deposition. It is shown that the absorption of the different kinds of layers becomes important in the VUV range. So, the optical contrast is enhanced and more precise structural information can be deduced and in particular the composition and crystalline character of the HfAlOx layers. Results are compared to those provided by other experimental techniques like x-ray reflection (XRR) and high resolution transmission electron microscopy (HRTEM).
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
