Abstract
An intense broad vacuum ultraviolet (VUV) optical absorption band with peak at 6.8 eV and halfwidth ≈1.7 eV is identified in irradiated glassy SiO 2 and assigned to dangling oxygen bonds (non-bridging oxygen hole centers, NBOHC). It was selectively created by photolysis of silanol (SiO–H) groups by 7.9 eV photons of F 2 excimer laser at low temperature. Subsequent analysis by VUV absorption, time-resolved luminescence, and electron paramagnetic resonance spectroscopies during thermal annealing showed an exact correlation to the well-known 4.8 and 2 eV absorption and 1.9 eV luminescence bands of NBOHC. The estimated oscillator strength of the 6.8 eV band is f≈0.05. This band may be one of the dominant causes of VUV optical absorption induced by excimer-laser irradiation of silica.
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