Abstract

Low-temperature Au­Au bonding was achieved under vacuum ultraviolet irradiation in the presence of oxygen gas (VUV/O3). The Au surfaces obtained after the VUV/O3 treatment were analyzed by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) measurements. The results indicate that the amount of carbon-based contaminants was dramatically decreased and that there was no serious damage to Au surfaces caused by the VUV/O3 treatment. The Au­Au bonding temperature was successfully reduced to 150°C after the VUV/ O3 treatment. The average shear strength was approximately 56MPa, and cross-sectional scanning electron microscopy (SEM) images of the bonded samples confirmed the absence of voids and cracks. Therefore, VUV/O3 treatment is highly effective for achieving low-temperature Au­Au bonding. [doi:10.2320/matertrans.MF201313]

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