Vacuum arc technique TAMEK: broad metal ion, plasma and electron beams generation

Abstract

This paper presents a review of vacuum arc facilities to be as injectors for metal ion accelerators. A vacuum arc in different modes: (1) arc current I/sub arc/=2-50 A, pulse duration t/sub p/=10 /spl mu/s to 20 ms; (2) I/sub arc/=20-100 A, t/sub p/=50-1000 /spl mu/s; (3) I/sub arc/=100-2000 A, t/sub p/=100-2000 /spl mu/s; and (4) I/sub arc/=10-100 kA, t/sub p/=1-10 /spl mu/s were investigated as metal ion injectors. The metal flows generated by cathode spots are expanded for diameters of 10-50 cm, and then deposited on the grounded target, or post accelerated between grids at U/sub accel/=10-120 kV. On the basis of such injectors the series of TAMEK (Technological Accelerator of Metal Ion and Electron Kit) sources were investigated with metal ion current from I/sub i/>0.01 A, pulse duration up to 20 ms, to I/sub i/<5 kA, t/sub p/=1-5 /spl mu/s. Any from the following surface (of metals, ceramics, glass, etc.) treatment modes: metal ion deposition, high intensive metal ion implantation, ion mixing, ion beam assisted deposition, high power metal ion beam irradiation, or electron beam irradiation are implemented by TAMEK sources. These results are also presented.