Abstract
Abstract Vacuum arcs on graphite cathodes are currently used as sources of carbon ions for the production of diamond-like films in the arc ion-plating (AIP) deposition process. Emission from these cathode sources is concentrated in very localized “cathode spots” having typically 10 (i.m in diameter for graphite cathodes. These spots carry the totality of the arc current, the remaining of the surface being unaffected by the discharge. For electron emission falling in the thermo-field emission mode, extremely high current densities up to 108 -109 Am-2 are induced generating a high localized heat flux to the surface during the spot lifetime. On metallic electrodes, this strong heat flux generates localized surface melting during the microsecond scale spot lifetime. High localized plasma pressures (>10 Atm in the case of copper) were found to exist in the cathode spot volume, leading to the co-emission of micro-droplets of the liquid metal along with the ion beam.
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