Abstract
We have begun measurements of UV-induced absorption in optical materials using an in situ testing system we have constructed. Samples are exposed in a vacuum system to the intense, tunable photon beam produced by the TOK undulator mounted on the NSLS VUV ring. The absorption of the samples is measured in the visible spectral region during the exposure. We present our results concerning the dependence of the induced absorption on the photon energy and flux. Using a differentially pumped isolation line, we can also modify the residual-gas environment around the samples during exposure to study the deposition of carbonaceous films. We describe our measurement of the carbon film growth caused by UV interaction with CO gas.
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