Abstract
Thin copper films with thickness ∼28 nm deposited on SiO2 substrate with the vacuum electron beam evaporation method and treated by UV-ozone are studied. It was found that a UV-ozone treatment of the copper film causes rapid formation of the thin ∼3-4 nm oxide film. XPS analysis showed that CuO oxide predominates in this film. The formed oxide film effectively protects the copper against the following oxidation. The presented method of UV-ozone treatment is a simpler and cheaper approach compared to many other ways to form protective coatings of copper to preserve its functional properties. This method can be useful in nanoelectronic, nanooptical, and biosensors applications.
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