Abstract
Photo-assisted molecular beam epitaxy of ZnSe on GaAs substrates with UV irradiation is reported. The growth rate is observed to be a function of the layer thickness and at high UV levels growth can be totally supressed. Photo-assisted doping has been investigated for the first time in ZnSe and changes of up to 20x in the doping level are reported for iodine, n-type doped material. The results are discussed in terms of hole accumulation at the surface affecting the incorporation of selenium and iodine.
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