Abstract
The UV absorption spectra of trimethylgallium (TMG), trimethylaluminum (TMA), and arsine were investigated, regarding the temperature dependences of the vapor spectra and the spectral change by adsorption. The physisorbed layer spectrum of TMA is quite different from the vapor spectrum, but that of TMG or arsine is similar to the vapor spectrum. It was found that TMA was physisorbed on silica as a monomer. On the other hand, the chemisorbed layer spectra for TMA and TMG were different from the vapor spectra. Arsine can be chemisorbed on the chemisorbed TMG layer, but not on silica. The spectrum of the co-chemisorbed layer, consisting of TMG and arsine, has been found to extend greatly to longer wavelengths. This suggests that light irradiation can selectively decompose TMG on As in the substrate surface in a GaAs MOCVD chamber, which is an elementary process for atomic layer epitaxy.
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