Abstract
Time of flight secondary ion mass spectrometry (ToF-SIMS) is frequently used to analyze industrial samples since it offers high (ppb) detection sensitivity, very high surface specificity (analysis of the top 1–3 surface layers during a spectral/image acquisition), high mass resolution (allowing the analyst the ability to separate Cu from C5H3 for instance), the ability to detect hydrogen, high depth resolution for depth profile measurements, and detection of high-mass fragments associated with molecular species/additives. In this manuscript, we demonstrate the advantages of ToF-SIMS including the ability to measure trace quantities of unexpected species on the surfaces of devices, and the ability to extract high-mass resolution information from data sets which were collected at degraded mass resolution. The importance of applying unbiased multivariate statistical analysis (MVSA) to the complete set of measured data is also demonstrated.
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