Abstract

In order to use touch control products more conveniently, a general objective is to develop lighter and smaller touch panels. A touch panel using the one glass solution (OGS) is an important development. The black matrix (BM) in an OGS touch panel is used as a black frame. The photoresist is divided into a positive photoresist and a negative photoresist. The BM photoresist is negative. After coating, exposure, and development in the BM process, after-develop inspection is implemented to check if the appearance is abnormal. It is quite difficult to rework the negative photoresist process. There is still room for improving the BM photoresist process capability Cpk. Thus, in order to reduce the customer complaint rate and enhance stability, the photolithography process is improved to enhance Cpk. Among the BM black negative photoresist forming process conditions of OGS products, the pre-baking time is the most important process control factor. The method set up herein improves the original Cpk = 0.90. This study employs the fast messy genetic algorithm (fmGA) to select the optimum orthogonal array of the Taguchi method, so as to implement the decision process of optimum parameter design. The Cpk of the optimum parameter is 2.12.

Highlights

  • Technology products have almost become indispensable in the modern world, as the mobile phone was upgraded to the multi-touch smart phone, the digital photo frame evolved into the tabletPC, the notebook computer evolved into the detachable touch-screen notebook computer, and wearable devices developed into the smart watch

  • The black matrix (BM) photoresist process influencing the appearance of the one glass solution (OGS) touch panel often results in customer complaints about the appearance abnormalities, or in influences on the function

  • This study proposes an experimental design method for improving the touch panel industry according to lithographic photoresist operating conditions

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Summary

Introduction

Technology products have almost become indispensable in the modern world, as the mobile phone was upgraded to the multi-touch smart phone, the digital photo frame evolved into the tablet. The difference from the general touch panel is that the OGS structure is combined with the functions of touch control and LENS/Cover Glass. The BM photoresist process influencing the appearance of the OGS touch panel often results in customer complaints about the appearance abnormalities, or in influences on the function. This study set up a demonstration and used the hybrid Taguchi-genetic algorithm to solve the quality stability problems in BM black negative photoresist forming and size of the OGS product [4,5,6,7]. The optimized experimental level combination of the BM black negative photoresist build-up dimension of the OGS product in the process was found to produce the optimum parameters meeting a satisfactory level, reducing the wasted expenses of additional defects, and improving the process

Literature Review
Research Method and Process Architecture
Hybrid Taguchi-Genetic Algorithm
Generation of Initial Chromosomes
Selection and Reproduction
Crossover
Mutation
Architecture of ANFIS
Layer 1 Input Layer
Layer 2 Rule Layer
Layer 3 Normalization Layer
Conclusion
ANFIS Learning Parameters
Case Analysis and Discussion
Target material temperature
Conclusions
Full Text
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