Abstract
Many qualitative properties of the product and the process are of interest during semiconductor manufacturing. One of the typical examples is the sidewall surface roughness of an etched polysilicon line. These properties are important since they affect directly the quality and performance of the integrated circuit (IC) devices being built. Traditionally, however, they are treated informally and subjectively as tacit knowledge in the processing arena. In this paper, we present a systematic approach to modeling and controlling such qualitative properties. This approach is based on treating qualitative process variables as categorical data that can be better understood with the help of formal statistical analysis known as logistic regression. This analysis reveals important relationships between the input process settings and the qualitative process output responses in a way that is similar to linear regression analysis for conventional numerical variables. Similarly, categorical process variables can be used for process control, which is driven by a probabilistic model of the categorical variables. We show how categorical models can be used to tune a process and, later, to control it via statistical process control (SPC) charts, model-based quality control techniques, and adaptive run-by-run controllers.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.