Abstract
Microfiche has been used as the photomask in 1:1 contact photolithography to generate structures of photoresist with features as small as 10 μm. Optical reduction of images that were printed by a high-resolution image setter on transparent polymer sheets generated patterns in microfiche. The photoresist patterns generated using microfiche as the photomask are useful in the fabrication of elastomeric stamps/molds/membranes for soft lithography. Four test structures fabricated using microfiche as photomask and soft lithography are used to evaluate the utility and resolution of this technique.
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