Abstract
ABSTRACTWe have studied the effect of substrate atomic steps on the azimuthal alignment of vapor-deposited pentacene crystals. Si(111) substrates with a low miscut angle were annealed at high temperature in ultra-high vacuum before the pentacene deposition; this produced surfaces with atomically flat terraces and arrays of parallel atomic steps. AFM analysis shows that pentacene deposited on these heated samples, at a low deposition rate, results in significant alignment of the pentacene crystals along the atomic steps.
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