Abstract
AbstractDefect characterization of 2D materials is a critical aspect for their successful integration in future electronic devices. Here, a simple characterization technique is proposed that opens a path for fast, non‐invasive, quality assessment of transition metal dichalcogenide layers, such as MoS2, and their interfaces. It relates to the correlation between substrate‐induced traps and the indirect‐to‐direct photoluminescence peak ratio. It is shown that the indirect peak is quenched when interfacial trap sites are present. A physical mechanism is proposed to explain the observations based on different recombination mechanisms.
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