Use of test structures for characterising a novel photosensitive organometallic material for MOS processes

M.H Dicks,J Lobban,G.M Broxton,John F Thomson ,J.t.m Stevenson ,A.j Walton

doi:10.1109/icmts.2003.1197362

Use of test structures for characterising a novel photosensitive organometallic material for MOS processes

M.H Dicks, J Lobban + Show 4 more

https://doi.org/10.1109/icmts.2003.1197362

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Publication Date: Jan 1, 2003

Citations: 2

Affiliation: Universities UK, University of Dundee, University of Edinburgh

#Use Of Test Structures #Organometallic Material + Show 8 more

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Abstract

A novel process is presented which produces platinum features using direct UV exposure of a photosensitive organometallic material. The deposited films are metallic and have a good adhesion to silicon dioxide. A test chip with MOS capacitors and sheet resistance structures fabricated using the new organometallic material has been characterised.

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