Use of multilayer structures, periodically etched, to implement compact diffractive optical devices

Abstract

Periodic multilayer structures, periodically etched, can be used to implement a large variety of diffractive optical devices, as these structures can combine the principle of diffraction by periodic structures, guiding properties and high reflection coefficients. In this paper, using a rigorous coupled-wave method we developed elsewhere, we model and size several devices which can operate as polarizing mirrors, narrowband transmission filters and blazed binary diffractive elements. We show the first experimental realizations we have carried out using Si/Si3N4 stacks obtained by PECVD and a focused ion beam etching.