Abstract
AbstractBased on numerical calculations a new method has been developed, which enables plasma analysis from the average value of the Langmuir probe current measured in pulsed discharge. The application of this method for characterization of a planar reactor used for plasma enhanced chemical vapor deposition of TiN and (TiAl)N hard coatings is described as an example. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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