Use of A GAS Jet Technique to Prepare Microcrystalline Silicon Based Solar Cells at High I-Layer Deposition Rates

Abstract

AbstractUsing a Gas Jet thin film deposition technique, microcrystalline silicon (μc-Si) materials were prepared at rates as high as 15-20 Å/s. The technique involves the use of a gas jet flow that is subjected to a high intensity microwave source. The quality of the material has been optimized through the variation of a number of deposition conditions including the substrate temperature, the gas flows, and the applied microwave power. The best films were made using deposition rates near 16 Å/s. These materials have been used as i-layers for red light absorbing, nip single-junction solar cells. Using a 610nm cutoff filter which only allows red light to strike the device, pre-light soaked currents as high as 10 mA/cm2 and 2.2-2.3% red-light pre-light soaked peak power outputs have been obtained for cells with i-layer thicknesses near 1 micron. This compares with currents of 10-11 mA/cm2 and 4% initial red-light peak power outputs obtained for high efficiency amorphous silicon germanium alloy (a-SiGe:H) devices. The AM1.5 white light efficiencies for these microcrystalline cells are 5.9-6.0%. While the efficiencies for the a-SiGe:H cells degrade by 15-20% after long term light exposure, the efficiencies for the microcrystalline cells before and after prolonged light exposure are similar, within measurement error. Considering these results, the Gas Jet deposition method is a promising technique for the deposition of μc-Si solar cells due to the ability to achieve reasonable stable efficiencies for cells at i-layer deposition rates (16 Å/s) which make large-scale production economically feasible.