Usage of total reflection for optical quality control of anisotropic thin films

Abstract

The problem of non-destructing quality control of anisotropic thin films is presented. Usage of total reflection from anisotropic thin films as an instrument of optical quality control is considered. It is shown, that several effects, namely multiple reflection, total reflection and anisotropy of the film influence on the reflection. Examples of total reflection from uniaxial thin films are presented. It is shown that small changes in optical properties of the films may substantially influence on the reflection. It was suggested that effects of media anisotropy coupled with total reflection and multiple reflection may result in sharp change of reflectivity for small changes of optical properties and /or film thickness and / or angles of orientation of media axes for thin films. It is suggested that effect of total reflection from thin films on a substrate may be used for determining optical properties of thin films and for controlling orientation of the optical axes within such films and /or thicknesses of such films.