Abstract
HVE-400 ion implanter is special ion implantation equipment for semiconductor materials boron and phosphorus doping. The ion source and extraction deflection system are at high voltage platform, while the corresponding control system is at ground voltage position. The control signals and measurement signals of various parameters at the high-voltage end need to be transmitted between ground voltage and high voltage through optical fibers to isolate high voltage. Upgrading is carried out due to the aging of the optical fiber transmission control and monitoring system, which cannot work stably. The transformation replaces the original distributed single-point control method with an advanced distributed centralized control method, and integrates all control and monitoring functions into an industrial control computer for digital operation and display. In the computer software, two kinds of automatic calculation of ion mass number are designed. After upgrading, the implanter high-voltage platform control and monitoring system features digitalization, centralized control, high reliability, strong anti-interference, fast communication speed, and easy operation.
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