University facilities and safety considerations for LPCVD and ion implantation

Abstract

The development of a comprehensive safety policy connected with the introduction of low-pressure chemical vapor deposition (LPCVD) and ion implantation at the Center for Microelectronics Engineering at RIT (Rochester Institute of Technology) is described. The scope of this safety policy includes equipment and facilities requirements, operational procedures, and personnel training. Such a plan must be coordinated with local emergency response teams and the RIT Office of Campus Safety. In addition, it must also meet the requirements of the Occupational Safety and Health Act, the Environmental Protection Agency, and state and local authorities. >