Abstract

The scaling approach to the irreversible epitaxial growth gained wide recognition due to its ability to describe with the use of a universal function the island size distributions (ISDs) corresponding to a broad range of experimental conditions. The approach, however, is operative only in the case of large average island sizes ${s}_{av}$ and large diffusion to deposition rates ratios $R$. Physically this corresponds to long deposition times and/or high temperatures. We argue that the ISDs exhibit yet another universality property which holds for much broader range of growth conditions, in particular, for low temperatures (small $R$) and small ${s}_{av}$ (short deposition times). We show that the normalized ISDs corresponding to the same ${s}_{av}$ are accurately described by the same universal distribution.

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