Abstract
AbstractAdvanced patterning techniques are essential to pursue applications of 2D van der Waals (vdW) materials in electrical and optical devices. Here, the direct optical lithography (DOL) of vdW materials by single‐pulse irradiation of high‐power light through a photomask is reported. The DOL exhibits large‐scale patterning with a sub‐micrometer resolution and clean surface, which can be applied to various combinations of vdW materials and substrates. In addition, the thermal profile during DOL is investigated using the finite element method, and the ideal conditions of DOL according to the materials and substrates are determined.
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