Abstract
The objective was to prepare scandium oxide layers on tungsten for the surface study of Sc-O/W(100) emitters using two design types of a compact evaporator for Sc 2 O 3 and for metallic scandium deposition. Both of these evaporators were compatible with ultrahigh vacuum operation in a specimen chamber optimized for surface analytical measurements. The Sc 2 O 3 evaporator allowed Sc 2 O 3 to be deposited on a substrate while maintaining its stoichiometric composition. It was also demonstrated that scandium oxide layers could be prepared effectively on a substrate by deposition of metallic scandium followed by oxygen exposure.
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