Uniformity optimization of ion beam sputtering coating equipment based on strong current ion source

Abstract

The widespread application of ion beam sputtering coating, especially in optical devices, requires the improvement of beam current intensity and uniformity of large-area uniform coatings. The advent of high current Penning sources offers a potential solution. This study introduces an automated optimization simulation method based on a three-electrode extraction system to investigate its influence on ion beam quality and uniformity. Focusing on high current intensity and uniformity, our simulation explores the effects of plasma electrode, inhibition electrode, and extraction electrode angles and distances on ion beam performance. Evaluation metrics include average beam intensity density, average energy of a single particle, and reciprocal variance of each macro particle position, which are achieved through normalization functions, allowing comprehensive comparison of simulation results. To assess coating efficiency, we estimate sputtering yield and depth. The study identifies patterns among electrodes and emphasizes the influence of different ion ratios on beam extraction. The results indicate that optimizing the angle of the plasma electrode and the distance of the suppressed electrode yields a highly uniform ion beam for low charge ions. However, for highly charged ions, similar optimization will reduce the current strength, so compensation needs to be achieved through electrode shape optimization. This research provides a model for systematically optimizing the three-electrode extraction system, guiding researchers in achieving optimal solutions based on ion source characteristics and application requirements. Additionally, we introduce a method of estimating the sputtering depth of mixed ion beams. This study provides valuable insights for advancing ion beam sputtering coating technology and reference for making the decision on design and application of ion source.