Abstract
Dual-axis galvanometer is used as a common beam steering component in diverse illumination and imaging approaches. In this paper, we propose an uncorrelated uniform illumination approach based on dual-axis galvanometric scanning. Specially, we analyze the mechanism of galvanometric illumination and elucidate three main factors affecting its uniformity properties. In this illumination module, the laser beam is deflected rapidly by the galvanometer which is driven by triangular voltage signals, and then focused by an f-θ lens to illuminate the object at an equal lateral scanning velocity. This method has lower coherent noise than extended laser illumination, higher brightness than partial coherent illumination and higher uniformity than galvanometric Lissajous trajectory driven by sinusoidal signals.
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