Understanding Nickel Thin Film crystallization using X-Ray Diffractometry

T Otiti,Gi Ekosse,Ts Sathiaraj

doi:10.4314/jasem.v11i2.54986

Abstract

Normal, helical and zigzag deposited Ni films were produced by letting a vapour stream of source material impinge on Corning 1737 glass substrates at oblique incidence while rotating the substrate during deposition. Films produced by glancing angle deposition (GLAD) technique while rotating the substrate. The microstructures of these Ni films were studied using X-ray diffractometry technique. The X-ray diffraction (XRD) patterns depicted 100% and 42% relative intensity (RI) peaks identified for normal and helical deposited Ni films but none for the zigzag deposited Ni film. Higher degree of crystallinity of Ni was demonstrated by the helical thin film sample having 200 nm thickness (sample Ni40) compared to the normal thin film which had only the 100% RI peak defined. Should an application therefore require Ni thin films of high crystallinity, it would be the film prepared with helical microstructure of 200 nm thickness that will be employed. @JASEM

Highlights

An area in which Ni has found applications is the usage of thin films, which are essential in modern technologies and their optimization is the focus of continued growing research
Controlling the column angle ( β ) and the flux angle ( α ) the density will vary in a predictable but not independently controllable or desirable manner. This direct dependence on flux angle ( α ) of both column angle ( β ) and film density restricts the range of thin film microstructure attainable
The limitation could be overcome by producing Ni films using glancing angle deposition (GLAD) (Robbie et al, 1997)

Summary

Introduction

An area in which Ni has found applications is the usage of thin films, which are essential in modern technologies and their optimization is the focus of continued growing research. By altering columnar inclination angle ( β ), and vapour incidence angle ( α ), different and varied properties of the films emerge which are characteristic for special applications. Deposition patterns of films could be normal, helical or zigzag.

Results

Conclusion