Understanding copper corrosion in bentonite-enriched environments: Insights from the point defect model

Abstract

The study simulated copper corrosion in a bentonite/groundwater solution, analyzing the kinetics of metal passivation through potentiodynamic polarization, potentiostatic polarization, and electrochemical impedance spectroscopy experiments. Morphological characterization provided insights into corrosion development patterns, and the mechanisms by which bentonite affects copper corrosion were comprehensively elucidated based on the point defect model. The findings revealed that bentonite affects copper corrosion resistance through Donnan exclusion, cation adsorption, and hydrolysis salt effects. At lower potentials, bentonite aids in inhibiting anodic dissolution, reducing the polarization current by approximately 75 % under certain conditions. With increasing bentonite content, the induction time for stable pitting corrosion shortens significantly, down to 10 %, the current surge before breakdown intensifies, and the breakdown potential decreases. When the bentonite volume ratio exceeds 0.5/0.1, the breakdown potential of OFP-Cu/OF-Cu markedly decreases and stabilizes at 0.1/0 VSCE. The microscopic mechanism of pitting corrosion induced by bentonite hydrolysis salts was elucidated using the point defect model, calculating the polarizability of the passive layer/outer layer interface as α = 0.1. The reliability of the cation adsorption and adsorption-desorption mechanisms was confirmed through experimental data fitting, point defect model fitting, and theoretical analysis.