Abstract
The underpotential deposition of Ag is investigated using voltammetry and potentiostatic current transient techniques in 0.1 M HClO 4 and 1.0 M H 2SO 4 containing Ag + ions (10 −5 to 10 −3 M) on polyfaceted single crystal and preferentially oriented (100)-type Pt electrodes, the latter being prepared through electrochemical faceting. Voltammetric results provide a very clean definition of the different conjugated peaks related to upd Ag, under practically no interference of O-containing surface species on Pt. No Ag penetration into bulk Pt can be noticed due to the single crystal nature of the substrate. Current transients are discussed and can be accounted for quantitatively in terms of the combined adsorption-desorption-nucleation and growth mechanism proposed recently by Rangarajan. Accordingly, it is possible that the number of Ag atoms required to attain a complete coverage of the substrate exceeds that of the Ag monolayer.
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