Abstract
The effects of low Tg underfill material on the reliability of high-Pb first level interconnects were assessed through elastic-plastic finite element modeling and inspection of failure sites at the first-level interconnect. Temperature-dependent changes in specific underfill parameters (elastic modulus and coefficient of thermal expansion) induced a primary tensile stress within the solder bump. The presence and magnitude of this tensile stress were highly dependent upon the maximum and minimum temperature of exposure. Under certain specific thermal conditions, a form of tensile ratcheting was identified through finite element modeling. The application of tensile stress was found to induce a change in degradation behavior and rates relative to the nominal shear stress state (see Figure). This effectively eliminated distance-to-neutral point as a predictor of first-level interconnects performance and required the development of new models to predict solder bump behavior. A discussion on this transformation in stress states and the potential influence on changes in part qualification procedures are provided.
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