Ultraviolet wave plates based on monolithic integration of two fully filled and planarized nanograting layers

Abstract

We successfully fabricated a high-performance half-wave plate for the 405 nm wavelength based on monolithic integration of two nanograting layers. Each of the nanograting layers functions as a quarter-wave plate. Both of the nanograting layers were fully filled and planarized to achieve the monolithic integration. UV-nanoimprint lithography, along with thin-film deposition, high-aspect-ratio reactive ion etching, and trench-filling technologies, was used in fabrication and integration of the individual nanograting layers. High-aspect-ratio nanogratings with sub-50 nm linewidths and 100 nm spacing were fabricated to achieve good optical performance at the near-UV wavelength. The ability to integrate multiple nanostructure-based optical layers opens a path for integrated multifunction devices, as well as a new strategy for driving both miniaturization and cost.