Abstract
The reasons underlying the selective acceleration of the etching of heavy-ion tracks in polyethylene terephthalate irradiated by ultraviolet radiation (UV) are examined. The use of high-performance liquid chromatography, atomic-force microscopy, and infrared (IR) spectroscopy enable us to ascertain that etching is accelerated mainly due to the photodestruction of radiolysis products, which leads to the formation of an additional amount of low-molecular products with carboxyl groups in the region of tracks, thereby ultimately accelerating the polymer-etching process.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
