Ultraviolet photoelectron spectroscopic study of the chemisorption and decomposition of formic acid on W(100)

Abstract

The chemisorption and decomposition of formic acid on a W(100) surface have been investigated by ultraviolet photoelectron spectroscopy (u.p.s.). Formic acid decomposes on a clean W(100) surface at 300 K to give initially an adsorbed layer of atomic C, O and H. On further exposure an increase in the coverage of C and O causes a displacement of H. This is followed by the formation of a molecular species. The nature and bonding of this molecular species are also discussed.