Abstract
In this study, laser ablation of a fluorine-doped tin oxide (FTO) thin film on a glass substrate was conducted using a 355nm Nd:YVO4 ultraviolet (UV) laser to obtain a 4×4mm microstructure. The microstructure contains a symmetric set of interdigitated FTO finger electrodes of a monolithic back-contact dye-sensitized solar cell (BC-DSC) on a common substrate. The effects of UV laser ablation parameters (such as laser fluence, repetition frequency, and scanning speed) on the size precision and quality of the microstructure were investigated using a 4×4 orthogonal design and an assistant experimental design. The incident photon-to-electron conversion efficiency and the current–voltage characteristics of the BC-DSC base of the interdigitated FTO finger electrodes were also determined. The experimental results show that an FTO film microstructure with high precision and good quality can be produced on a glass substrate via laser ablation with high scanning speed, high repetition frequency, and appropriate laser fluence.
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