Abstract
Abstract Oxidized silicon wafers were functionalized in mild conditions using alkoxysilanes containing perfluoropolyether chains: the reaction was monitored by FTIR and very thin fluorinated films were formed. After the treatment, the surface tension of the wafers decreased dramatically (from 43 mN/m for the neat wafer to 21–13 mN/m depending on the conditions of the silanization process), high repellency toward polar and apolar media was achieved. The composition of the fluorinated coatings was investigated in details by XPS spectroscopy.
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