Ultra-thin oxide layer formation on Cu–9% Al(1 1 1) surface and Pd growth studied using reflection high energy electron diffraction and Auger electron spectroscopy

Abstract

In previous studies the formation of ultra-thin monocrystallic alumina layer on single crystal Cu–9% Al (1 1 1) surface was reported together with an optimal oxidation procedure for the creation of well-ordered layers. Here we demonstrate the perfect flatness of oxide layer by reflection high energy electron diffraction (RHEED) measurement. The chemical composition of the surface layer was investigated by Auger electron spectroscopy (AES), which was also used for the determination of the alumina layer thickness. The configuration of experiment enabled RHEED measurement to be performed simultaneously with the oxidation, and our results show an alumina growth of Frank-Van der Merwe-type. A Pd was deposited on the alumina film. RHEED observations show the dependence of Pd growth on the deposition rate.