Abstract
Using ultrathin alumina membranes (UTAMs) as evaporation or etching masks large-scale ordered arrays of surface nanostructures can be synthesized on substrates. However, it is a challenge for this technique to synthesize quantum-sized surface structures. Here an innovative approach to prepare UTAMs with regularly arrayed pores in the quantum size range is reported. This new approach is based on a well-controlled pore-opening process and a modulated anodization process. Using UTAMs with quantum-sized pores for the surface patterning process, ordered arrays of quantum dots are synthesized on silicon substrates. This is the first time in realizing large-scale regularly arrayed surface structures in the quantum size range using the UTAM technique, which is an important breakthrough in the field of surface nanopatterning.
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