Abstract
In this paper, the effect of ultrasonic field on the morphology, optical and wetting properties of anodized SnOx film was revealed. X-ray diffraction, field emission scanning electron microscopy, ultraviolet–visible–near-infrared spectroscopy, electrochemical impedance spectroscopy and contact angle analyzer measurements were employed to characterize the as-prepared obtained films. Based on the analysis of these obtained results, it can be confirmed that the application of ultrasonic field has a significant influence on the reactive activity of Sn crystal plane, interface charge transfer, total current (including ionic current and electronic current), microstructure uniformity, and optical absorption property of anodized SnOx films. This study opens a new window to prepare highly uniformed SnOx films with excellent semiconductor performance and superhydrophilic properties by introducing the ultrasonic field to anodic oxidation process.
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