Abstract
Oxides, borides and carbides of the transition elements are materials of great interest from a technologic point of view. Many of these materials are used in the form of thin films, so several techniques are commonly used to deposit them. Among these techniques, Pulsed Laser Deposition (PLD) performed using ultra-short pulse lasers, mainly fs lasers, presents unique characteristics in respect to PLD performed using conventional short pulse lasers. Indeed, the films deposited using fs PLD are often nanostructured, and this technique often allows the target stoichiometry to be transferred to the films. In this work, we will review the use of ultra-short PLD in the production of films obtained from transition metal oxides, borides and carbides, evidencing the advantages offered by this technique, together with the problems arising with some of the studied systems. We conclude that even if ultra-short PLD is surely one of the most important and useful deposition techniques, it also presents limits that cannot be ignored.
Highlights
The binary compounds of the first elements of the groups 13, 14 and 16 of the periodic table with transition elements are materials of great interest since many of these compounds find large application for their peculiar characteristics
The aim of the paper was to study the application of the nanostructured TiO2 films to laser-assisted Laser Desorption Ionization (LDI) of small peptides and synthetic polymers, and the results indicated good performances for the films deposited using fs Pulsed Laser Deposition (PLD)
Considering the performances of PLD carried out using fs lasers on the deposition of thin films of oxides, carbides, and borides of transition elements, it is evident that this technique is not the final solution of the problems presented by conventional PLD
Summary
The binary compounds of the first elements of the groups 13 (boron), 14 (carbon) and 16 (oxygen) of the periodic table with transition elements are materials of great interest since many of these compounds find large application for their peculiar characteristics. Though continuous waveshown lasers can to ablate solid to targets, laser ablation in general performed This method has been to be be used suitable deposit thin films,isoften maintaining the using pulsed lasers and in this case is currently known as Pulsed. Be can on be deposited on whereby a substrate in a takes suitable position to produce the growth of a thin deposited on a substrate placed in a suitable position to produce the growth of a thin film This technique is called Pulsed Laser Deposition (PLD) and can be carried out both in vacuum and technique is called. Considering the importance of plasma characteristics for PLD, a brief description of the principles of PLA will be reported, with particular attention to the expansion of the plasma in vacuum since a large part of the systems reviewed in this work were deposited in those conditions
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