Ultrahigh vacuum sample heating stage for molecular beam epitaxy applications with transfer mechanism to a remote scanning tunneling microscope

Abstract

An ultrahigh vacuum (UHV) sample heating stage and sample holder are described which utilize radiant and electron bombardment heating to achieve sample temperatures up to 1300 K. The sample surface is widely accessible by the various beams associated with surface preparation, monitoring, and deposition. The design is based on a commercially available Omicron scanning tunneling microscope (STM) sample holder and allows transfer to an auxiliary mobile UHV system and thence to a STM and other UHV facilities.