Abstract

We have investigated ultrafast optical responses of undoped GaAs/n-type GaAs (i-GaAs/n-GaAs) epitaxial structures at room temperature using a reflection-type pump-probe technique. The built-in electric field in the i-GaAs layer is controlled by its thickness. It is found that the decay time of a photoexcitation-induced reflectivity change in a sub-picosecond range decreases with an increase in the built-in electric field strength. The observed optical response is related to the transport process of photogenerated carriers from the i-GaAs layer to the n-GaAs layer. The shortest response time about 60 fs demonstrates that the i-GaAs/n-GaAs structure is useful for ultrafast optical applications.

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