Abstract
Summary form only given. Ultrafast pulsed laser deposition is a novel technique for depositing particle-free, thin solid films using very high repetition rate lasers. The process involves evaporation of the target by low energy laser pulses focused to an optimum intensity to eliminate particles from the vapour. This results in films with very high surface quality whilst the very high repetition rate increases the overall deposition rate. We report an experimental demonstration of the process by creating ultrasmooth, thin, amorphous carbon films using high repetition rate Nd:YAG lasers. Both a 10 kHz, 120 ns Q-switched Nd:YAG laser, or a 76 MHz 60 ps mode-locked Nd:YAG laser were used in the experiments.
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