Ultra-smooth surface with 0.4 Å roughness on fused silica

Abstract

Ultra-smooth surface with sub-nanometer roughness is of great significance in various fields, including Ring Laser Gyro (RLG), high-power laser apparatus, ultraviolet optical systems, and the semiconductor industry. However, the mechanism of the ultra-smooth polishing process remains to be studied, which is of great value for understanding and optimizing optical-fabrication methods. This paper establishes a relationship between surface densification characteristics and surface roughness in conventional polishing. Moreover, we conclude that the densification process created by the longitudinal pressure, which avoids non-uniformity, is beneficial to forming super-smooth surfaces in the conventional polishing methods. Under this guidance, we can stably fabricate ultra-smooth surfaces on fused silica with 0.4 Å roughness. This result overturns the mainstream view that the longitudinal pressure in polishing should be minimized. This conclusion is meaningful for the understanding of the ultra-smooth surface formation not only in conventional polishing but also in other optical-fabrication technologies.