Abstract
A method of preparation of extremely pure magnetic thin films, especially magnetic nitride nanocomposites for GHz aplications was searched. The plasma-jet method was chosen for its advantages at magnetic materials deposition. Sources of impurities deteriorating the quality of the films were analysed. Based on the assumption that the achievable purity is limited mainly by the conditions at the deposition, an experimental UHV apparatus with the plasma-jet was designed. A number of magnetic thin films from various materials including nitride nanocomposite films was prepared already in this apparatus at UHV conditions. Their magnetic properties are far better than those of the films prepared in a high vacuum apparatus.
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