Abstract
A real-time measurement method for two-dimensional (2D) spatial distribution of the electron temperature and plasma density was developed. The method is based on the floating harmonic method and the real time measurement is achieved with little plasma perturbation. 2D arrays of the sensors on a 300 mm diameter wafer-shaped printed circuit board with a high speed multiplexer circuit were used. Experiments were performed in an inductive discharge under various external conditions, such as powers, gas pressures, and different gas mixing ratios. The results are consistent with theoretical prediction. Our method can measure the 2D spatial distribution of plasma parameters on a wafer-level in real-time. This method can be applied to plasma diagnostics to improve the plasma uniformity of plasma reactors for plasma processing.
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