Abstract
We have developed a two-dimensional analytical model for the channel potential, threshold voltage, and drain-to-source current of a symmetric double-halo gate-stacked triple-material double-gate metal---oxide---semiconductor field-effect transistor (MOSFET). The two-dimensional Poisson's equation is solved to obtain the channel potential. For accurate modeling of the device, fringing capacitance and effective surface charge are considered. The basic drift---diffusion equation is used to model the drain-to-source current. The midchannel potential of the device is used instead of the surface potential in the current modeling, considering the fact that the punch-through current is not confined only to the surface in a fully depleted MOSFET. An expression for the pinch-off voltage is derived to model the drain current in the saturation region accurately. Various short-channel effects such as drain-induced barrier lowering, gate leakage, threshold voltage, and roll-off have also been investigated. This structure shows excellent ability to suppress various short-channel effects. The results of the proposed model are validated against data obtained from a commercially available numerical device simulator.
Published Version
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