Abstract
Two-dimensional spatial profiles of plasma parameters during the DC magnetron sputtering process of an indium-tin-oxide (ITO) target in Ar/O 2 are studied. Two-dimensional spatial profiles of sputtered indium atoms in the ground state and of argon and indium atoms in their excited states are measured by two-dimensional laser induced fluorescence (2D-LIF) and two-dimensional optical emission spectroscopy (2D-OES), respectively. The 2D-OES profiles of the excited species have strong radial inhomogeneity due to magnetron plasma ring formation. On the other hand, the 2D-LIF profile of sputtered In atoms has the maximum at the discharge center axis except for the proximity of the cathode and has a smooth decrease from the cathode to the anode. Effects of the preset partial-pressure of introduced O 2 on these parameters is also reported.
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