Two-dimensional colloidal particle assembly in ionic surfactant solutions under an oscillatory electric field

Abstract

Assembling colloidal particles under oscillatory electric field (OEF) has become an emerging bottom-up technique to synthesize advanced materials and fabricate micro/nano devices. Surfactants have often been used in colloidal dispersions to improve their stability. However, the precise role of surfactants in particle assembly processes under OEF is unknown. Here, we systematically study the effects of ionic surfactants on the colloidal particle assembly process subject to a fixed OEF, by using an anionic surfactant (sodium dodecyl sulfate) and a cationic surfactant (cetyltrimethylammonium bromide). In the concentration range below the critical micelle concentration (CMC), the particles tend to form three different aggregate structures, including randomly close-packed, hexagonally close-packed crystals, and randomly non close-packed structures. In the concentration range at CMC and above, the particles cannot assemble into any aggregate structures under the given OEF. With increasing surfactant concentration, the average interparticle separation distance within the aggregate can be regulated in a wide range. We qualitatively interpret the observed variation of particle assembly behaviors in different surfactant solutions based on the particle/particle interaction energy, implying that the repulsive electric double-layer interaction is significantly enhanced with increasing ionic surfactant concentration and hinders the particles approaching close to the high-energy barrier. These results suggest that the particle aggregate structure and interparticle separation distance of the two-dimensional colloidal assembly can be manipulated by controlling the ionic surfactant concentration according to the requirements of practical applications.